Demonstration of Nonpolar A-Plane InGaN/GaN Light Emitting Diode on R-Plane Sapphire Substrate
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- Category: Molybdenum & Sapphire Growth Furnace News
- Published on 17 January 2014
- Written by Cloudy
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High crystalline a-plane GaN epitaxial layers with smooth surface morphology were grown on r-plane sapphire 
substrate by metalorganic chemical vapor deposition. The full width at half maximum of x-ray rocking curve was measured as 407 arc sec along c-axis direction, and the root mean square roughness was 1.23 nm. Nonpolar a-plane InGaN/GaN light emitting diodes were subsequently grown on a-plane GaN template, and the optical output power of 0.72 mW was obtained at drive current of 20 mA (3.36 V) and 2.84 mW at 100 mA (4.62 V) with the peak emission wavelength of 477 nm.
Laser lift-off technique was employed to carry out transfer of prefabricated InGaN multiple-quantum-well light-emitting diodes (LEDs) from sapphire onto Cu substrate. Silver epoxy was used as the bonding material. Characterization results showed tremendous device improvements in terms of maximum allowable current, light output power, and reliability from the use of conductive Cu substrate. LEDs on Cu could withstand a maximum current of 530 mA before breakdown while those on sapphire could only withstand 350 mA. At 40 mA, light output power of LEDs on sapphire and Cu was 0.74 and 0.95 mW, respectively. In addition, reliability test at constant current of 300 mA showed improvement in light output power for LEDs on Cu whereas LEDs on sapphire suffered deterioration with time.
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