Substrate Effects on ZnO Nanostructure Growth Via Nanoparticle-Assisted Pulsed-Laser Deposition
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- Category: Molybdenum & Sapphire Growth Furnace News
- Published on 07 January 2014
- Written by Cloudy
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The effects of various substrate conditions on the morphology, crystal structure and photoluminescence of ZnO 
nanostructures synthesized by nanoparticle-assisted pulsed-laser ablation deposition were investigated. It is concluded that the sapphire substrate with a 1 h anneal at 1000 °C is the most favorable to the vertical growth of ZnO nanostructures. SEM analysis indicates that the well-aligned diameter-modulated ZnO nanonails with unique shape were successfully synthesized on the annealed sapphire substrate. The as-synthesized ZnO nanostructures exhibit an ultraviolet emission at around 390 nm and the absent green emission under room temperature, indicating that there is a very low concentration of deep-level defects inside ZnO lattices. The novel ZnO nanostructures could offer novel opportunities for both fundamental research and technological applications.
Lon implantation into III–V nitride materials is animportant technology for high-power and high-temperature digital and monolithic microwave integrated circuits. We report the results of the electrical, optical, and surface morphology of Si ion-implanted GaN films using furnace annealing. We demonstrate high sheet-carrier densities for relatively low-dose (natoms=5×1014 cm−2) Si implants into AlN/GaN/sapphire heteroepitaxial films. The samples that were annealed at 1150°C in N2 for 5 min exhibited a smooth surface morphology and a sheet electron concentration ns ∼9.0×1013 cm−2, corresponding to an estimated 19% electrical activation and a 38% Si donor activation in GaN films grown on sapphire substrates. Variable-temperature Hall-effect measurem entsindicate a Si donor ionization energy ∼15 meV.
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