LaF3 Films Deposited by Molybdenum Boat Evaporation
- Details
- Category: Molybdenum knowledge
- Published on 30 July 2013
- Hits: 356
LaF3 thin films at 193 nm were deposited by the molybdenum boat evaporation with ion-assisted deposition (IAD). Various optical characteristics, stress, and microstructures that formed under different ion-beam voltages of IAD deposition were investigated.
The relation between these properties is also discussed. LaF3 films deposited with IAD exhibited small rough surfaces and large optical loss at 193 nm.
The largest value of optical loss for films at 193 nm, which were prepared at an ion-beam voltage of 400 V, was 1.55% and the extinction coefficient was smaller than 0.0015.
Microstructures and crystalline structures of films were influenced and changed by the ion-assisted deposition process. Tensile stress value of films increased as the ion-beam voltage rose.
More molybdenum product: http://www.molybdenum.com.cn
Tel: 0592-5129696 Fax：0592-5129797
E-mail:
This email address is being protected from spambots. You need JavaScript enabled to view it.
Tungsten Picture Center: http://picture.chinatungsten.com
Tungsten Video Center: http://v.chinatungsten.com
Tungsten News & Tungsten Prices, 3G Version: http://3g.chinatungsten.com
sales@chinatungsten.com