High Purity Molybdenum Target
- Details
- Category: Molybdenum knowledge
- Published on 14 March 2013
- Hits: 727
Adopting physical vapor disposition technology (PVD), the pure Molybdenum sputtering target with purity degree over 99.99% is an extremely important key material on the production of thin-film material.Differed from common Molybdenum, high purity Molybdenum sputtering target can form higher quality film due to its less impurity content and high chemical purity. Currently, it is widely used in thin film transistor liquid crystal display (TFT-LCD), wiring material of very large integrated circuit in semiconductor industry, new film type solar battery in the solar industry and other high-tech & new materials fields.
Classification:
According to different chemical specifications,high purity molybdenum target could be classified into the grades of "99.99%" and "99.999%".
| Name | Formula | Spec. | Dimension(mm) | Relative Density | Crystallite size | Defects |
| Pure Mo target | Mo |
4N（99.99% 5N（99.999%） |
D100～1200 T6～25 |
≥99% | <50µm |
0 |
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